Chemical Pump; Clean-In-Place Installation - GE 000 gpd Operation And Maintenance Manual

Water purification machines 3 m3/hr to 45 m3/hr 18,000 gpd to 288,000 gpd
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4.
Turn the AUTO/HAND Button on the Purge Button located on the OIT to the
"AUTO" position.
With multiple remote devices wired in series, as described above, an open contact
from any of the configured devices will activate the Permeate Purge Cycle.
5.3

Chemical Pump

GE Osmonics offers a stand-alone chemical pump and tank that can be used to control the
pH of the RO system. Refer to the Spare Parts List (P/N 1233377) for ordering informa-
tion.
5.4

Clean-In-Place Installation

GE Osmonics has installed a flange connection in the inlet line of the E-CE RO machines.
Refer to Table 2.5 (Connections) for connection sizes. Valved Clean-In-Place (CIP) con-
nections are provided on permeate and concentrate outlets to allow flow back to the clean-
ing tank. GE Osmonics offers a stand alone CIP system, refer to the Spare Parts List
(P/N 1233377).
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