Safety Warnings - Oxford Plasmalab 80 Plus Operating Manual

Plasma etcher
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NANOSYSTEM FABRICATION FACILITY (NFF), HKUST 
Machine protections fitted where appropriate:
1. A nitrogen pressure switch, to detect adequate purge pressure to turbo molecular
pump bearings or;
2. A nitrogen flow meter, to detect purge gas flow to pump bearings.
3. Water flow switch.

4.2 Safety Warnings

This equipment can cause injury if not used in a cautious manner.
1. Do not operate the system if any of the doors, panels or covers is removed.
2. Ensure that all personnel who operate this equipment are trained to use the
equipment, and are alerted to the range of hazards present.
3. When opening the processing chamber, ensure that personnel stand clear of
the chamber lid and hoist assembly.
4. Close chamber door carefully, ensure that personnel vacate the vicinity of the
door and its operating mechanism before it is closed to avoid trapped fingers
etc.
5. Ensure that you do not leave tweezers between the lid and the base, damage
the equipment could occur.
6. When the compressed air is first applied to the system, the initial chamber lid
movement will be repaid unless the "HOIST" buttons are operated
intermittently.
7. If the sample to be etched contains photo resist, then the substrate must be
baked immediately before placing it in the chamber.
 
Version 1.0
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